Positive resist composition
US5891601A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Oct 15, 1997 |
| Grant date | Apr 6, 1999 |
| Priority date | — |
| Expiry date | Oct 15, 2017 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/106
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A positive photo resist composition of chemical amplifying type, which is excellent in various properties such as sensitivity, resolution, heat resistance, film retention ratio, applicability and profile and also excellent in time delay effect resistance, and which comprises PA1 (A) a resin which is converted to alkali-soluble from alkali-insoluble or alkali-slightly soluble by the action of an acid, PA1 (B) an acid generator and PA1 (C) a dipyridyl compound represented by the following formula (I): ##STR1## wherein, Z represents an organic bonding group having least one hetero atom, and R.sup.1, R.sup.2, R.sup.3, R.sup.4, R.sup.5 and R.sup.6 each independently represent hydrogen or an alkyl group having 1 to 4 carbon atoms.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.