Virtual mask digital electron beam lithography
US5892231A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Feb 5, 1997 |
| Grant date | Apr 6, 1999 |
| Priority date | — |
| Expiry date | Feb 5, 2017 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/31786
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
Systems and methods for direct-to-digital holography are described. An apparatus includes a laser; a beamsplitter optically coupled to the laser; a reference beam mirror optically coupled to the beamsplitter; an object optically coupled to the beamsplitter, a focusing lens optically coupled to both the reference beam mirror and the object; and a digital recorder optically coupled to the focusing lens. A reference beam is incident upon the reference beam mirror at a non-normal angle, and the reference beam and an object beam are focused by the focusing lens at a focal plane of the digital recorder to form an image. The systems and methods provide advantages in that computer assisted holographic measurements can be made.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.