X-ray source for lithography
US5892810A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | May 9, 1990 |
| Grant date | Apr 6, 1999 |
| Priority date | — |
| Expiry date | May 9, 2010 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05G2/00
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
An x-ray lithography device in which a beam of electrons interacts with a microwave field of a quasi-optical maser such as a quasi-optical gyrotron. This maser comprises a pair of spaced mirrors defining a quasi-optical cavity therebetween, with one mirror being provided with an orifice to permit extraction of the x-ray beam produced. A Bragg reflector is connected to the mirror orifice to reduce the microwave power loss from the device through the orifice. Electrons injected in the maser cavity are caused to "wiggle" by the interacting microwave field, which functions as an undulator, so as to produce a non-coherent x-ray beam that travels along the longitudinal axis of the cavity and exits through the mirror orifice.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.