Real time monitor of reacting chemicals in semiconductor manufacturing
US5893046A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jun 24, 1996 |
| Grant date | Apr 6, 1999 |
| Priority date | — |
| Expiry date | Jun 24, 2016 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N21/27
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method and apparatus provide for monitoring and controlling a chemical process with a chemical substance adapted for treatment of a semiconductor device. The chemical substance is held in a container. The process of monitoring is provided by transmitting a light or other electromagnetic energy from a source located within the container through the chemical substance. The electromagnetic energy transmitted through the chemical substance is sensed with a photosensor or a photosensor fiber located within the container. A comparison to a standard is made of the result of the sensing by spectrum analysis, with a passband filter between the source and the photosensor. The sensor may comprise a wavelength adjustable photosensor or a multiple wavelength photosensor.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.