Impedance-assisted electrochemical removal of material, particularly excess emitter material in electron-emitting device
US5893967A · kind A · utility
6Cited by
31References
40Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 30, 1997 |
| Grant date | Apr 13, 1999 |
| Priority date | — |
| Expiry date | Jun 30, 2017 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J9/025
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An impedance-assisted electrochemical method is employed for selectively removing certain material from a structure without significantly electrochemically removing certain other material of the same chemical type as the removed material.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.