Patent · US Expired

Method of fabricating a photo-device

US5895227A · kind A · utility

1Cited by
0References
7Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMay 27, 1997
Grant dateApr 20, 1999
Priority date
Expiry dateMay 27, 2017

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10F77/413

Abstract

A method of fabricating a photo-device includes the steps of forming an optically nontransparent, electrically conductive layer on the surface of a photoelectric conversion substrate, and transferring a portion of the optically nontransparent, electrically conductive layer using a scanning probe process apparatus to form, over an optical window, a light-permeable protective insulation structure of a region of the optical window on the substrate surface beneath the light-permeable protective insulation structure.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.