Transfer method for relief patterns
US5895541A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | May 26, 1995 |
| Grant date | Apr 20, 1999 |
| Priority date | — |
| Expiry date | May 26, 2015 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/40
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A parting layer 12, colored layer 13, reflective layer 14, and photosensitive resin layer 15 are laminated to base film 11 of relief pattern transfer sheet 10. When forming letters on the face of a timepiece, photosensitive resin layer 15 is first exposed through negative film 16. Mask areas 161 of a pattern corresponding to the letters are formed in negative film 16. Therefore, when photosensitive resin layer 15 is developed by a water wash, molded resin layer 150 of the specified pattern is left on base film 11 with parting layer 12, colored layer 13, and reflective layer 14. Pressure-sensitive adhesive layer 17 is then formed only on the surface of molded resin layer 150, and relief pattern transfer sheet 10 is bonded to the timepiece face. When relief pattern transfer sheet 10 is thereafter pulled off of the timepiece face, reflective layer 14 and colored layer 13 corresponding to the areas in which molded resin layer 150 is formed are also transferred to the timepiece face.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.