Renewable polishing lap
US5897424A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jul 10, 1995 |
| Grant date | Apr 27, 1999 |
| Priority date | — |
| Expiry date | Jul 10, 2015 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB24B37/26
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
A polishing lap which is resistant to attack from corrosive and reactive ishing media and which has a surface which is sufficiently resilient to provide good finishes without hindering dimensional controlling and accuracy of the texturing comprises: a lap substrate wherein the surface of the lap substrate has an overall shape and a localized texture; and a replaceable lap film applied to the lap substrate surface and which is deformed to correspond to the localized texture of the lap substrate surface. The polishing lap can be easily reconditioned if contaminated or easily modified for use with different abrasives and polishing media.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.