Thin film optical measurement system
US5898181A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Sep 22, 1997 |
| Grant date | Apr 27, 1999 |
| Priority date | — |
| Expiry date | Sep 22, 2017 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG11B23/507
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method and apparatus for inspecting a reflective surface, or material on such surface, such as lubricant and planarizing layers on a substrate surface. A beam of controlled polarization impinges obliquely at a spot in the plane of the substrate. A collector such as an integrating sphere is spaced away from the substrate and has an opening oriented to catch the oblique specular reflectance from the surface. Preferably the opening is substantially larger than the beam, so that substrate run out does not send the beam astray or defeat its measurement, and the oblique beam is aimed at an angle lying between the Brewster angle of the lubricant and that of the adjacent layer. A temperature-controlled laser diode with constant-current driver provides a beam that is free of wavelength hops and amplitude changes, making beam aiming repeatable and allowing point-by-point comparisons of the detected reflectance. The substrate spins at high speeds on an encoded shaft, and the assembly is radially stepped to allow inspection of the substrate at radial and angular positions while a microprocessor synchronized with the spinning substrate collects light data to compile a map of surface reflectan…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.