Yttrium tantalate x-ray phosphors with reduced persistence
US5900188A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Sep 23, 1997 |
| Grant date | May 4, 1999 |
| Priority date | — |
| Expiry date | Sep 23, 2017 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC09K11/7774
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
A composition and method are provided for reducing the persistence of yttrium tantalate x-ray phosphors having the monoclinic M' structure. Persistence is reduced by incorporating a tungsten additive into the phosphor. The phosphor preferably contains at least about 4 ppm W. The method for incorporating the tungsten additive consists of adding a tungsten containing compound to the mixture of raw materials formulated to make the phosphor and firing the mixture at a temperature and for a time sufficient to form the phosphor.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.