Method of producing a colorating coating
US5900289A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Nov 29, 1996 |
| Grant date | May 4, 1999 |
| Priority date | — |
| Expiry date | Nov 29, 2016 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S427/106
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method of producing a thin coating by plasma-assisted chemical vapor phase deposition from a carbonaceous and metalliferous gas phase of a predetermined composition on a substrate surface especially in the form of a diamond-like carbon-silicon-hydrogen compound, wherein for the coloration the optical thickness of the coating or of one layer region or of a plurality of layer regions of the coating each, is predetermined in one single vacuum coating process in that due to interferences of the first order and/or of a higher order the desired color impression results at the coating or at its layer region(s) according to the principle of interference at thin films, and in the portion of the coating adjacent to the substrate surface first of all a non-colorating layer region, providing hardness and wear resistance of the complete coating, is produced with a larger thickness in relation to the colorating region or regions, wherein preferably shortly before achieving the total thickness of the coating the composition of the layer-forming gas phase is continuously or stepwise changed in that, in addition to the colorating layer regions to be deposited thereon, at least one gradient of the…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.