Developer for irradiated radiation-sensitive recording materials
US5900352A · kind A · utility
3Cited by
7References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 27, 1997 |
| Grant date | May 4, 1999 |
| Priority date | — |
| Expiry date | Aug 27, 2017 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/322
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A process for developing irradiated radiation-sensitive recording materials using an aqueous-alkaline developer which contains compounds of the formula (I) ##STR1## wherein A is H, Na, K, NH.sub.4 or NR.sub.4, where PA1 R is a substituted or unsubstituted alkyl radical, PA1 W and X, independently of one another are H or --CH.sub.2 --COOA, PA1 Y is H or COOA and PA1 Z is H or OH, wherein the compound of the formula (I) contains at least 3 COOA units.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.