Material flow control arrangement and method
US5901729A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Apr 15, 1997 |
| Grant date | May 11, 1999 |
| Priority date | — |
| Expiry date | Apr 15, 2017 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T137/88062
- WIPO fieldEngines, pumps, turbines
- WIPO sectorMechanical engineering
Abstract
A dosing apparatus 1 includes a material flow control arrangement 2 including vertical ducting 4 having co-axial therewith a vertically reciprocatory rod 5 mounting at its ends inlet and outlet valve closure plugs 6a and 6b. The upper and lower end zones of the ducting 4 define respective circular-cylindrical inlet and outlet 13a and 13b bounded by respective circular-cylindrical valve seats 14a and 14b in which the plugs 6a and 6b are sliding fits. Mounted on at least one horizontal extension piece 4d of the ducting 4 is at least one dosing pump 16. When the outlet 13b is closed by the plug 6b, the cross-section of the inlet 13a is unobstructed; similarly, when the inlet 13a is closed by the plug 6a, the cross-section of the outlet 13b is unobstructed. Furthermore, in an intermediate position of the rod 5, the cross-sections of both the inlet 13a and the outlet 13b are unobstructed, so that passage of a cleaning fluid through the ducting 4 is facilitated.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.