Imaging system using a compound elliptical concentrator
US5903403A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Jan 24, 1997 |
| Grant date | May 11, 1999 |
| Priority date | — |
| Expiry date | Jan 24, 2017 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03G15/043
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
An imaging system includes a compound elliptical concentrator having an illumination source at an entry aperture and having an exit aperture directed to project light onto the surface of an object. The compound elliptical concentrator includes first and second reflective surfaces that are arcs of different ellipses. The ellipse that defines the arc of the first reflective surface has one focus that is proximate to an entry end of the second reflective surface. The ellipse that defines the arc of the second reflective surface has a focus that is proximate to the entry end of the first reflective surface. The other foci of the ellipses are at or beyond the exit aperture of the compound elliptical concentrator and are preferably symmetrically aligned with respect to the surface to be imaged. The reflective surfaces are on the opposite sides of a plane of symmetry and are configured such that multiple reflections of extreme rays from the illumination source are deterred. In some embodiments, the light returned from the surface of the object is coupled to a detector along a path that re-enters the compound elliptical concentrator and then passes through an opening in one of the reflecti…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.