Method of subliming material in CVD film preparation method
US5904771A · kind A · utility
Assignees
Inventors
Key dates
| Filing date | Apr 3, 1997 |
| Grant date | May 18, 1999 |
| Priority date | — |
| Expiry date | Apr 3, 2017 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC30B29/30
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method of subliming material is provided for use in a CVD film preparation method wherein a CVD precursor is sublimed from its solid state by heating to a temperature not exceeding its melting point, thereby producing a vapor of the precursor, and the vapor of the precursor is transported to a reactor. The method of subliming material comprises the steps of forming the solid-state compound into a film, covering a back surface of the film with a non-reactive support and exposing a front surface of the film to an atmosphere as a sublimation surface. The method maintains the exposed surface area of the solid compound constant during processing.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.