Patent · US Expired

Free-standing rotational rod-fed source

US5905753A · kind A · utility

0Cited by
6References
19Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJun 23, 1997
Grant dateMay 18, 1999
Priority date
Expiry dateJun 23, 2017

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC23C14/246
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

In a rotational rod-fed electron-beam evaporation source used with sublimating rod material, the ingot rod can be free-standing with respect to the crucible. This means that the side of the ingot rod near the tip of the rod does not contact a cooling crucible. In this way, the system can be operated in a defocused position of the electron beam, and the sweep of the electron beam can go over the edge of the ingot rod tip. Using these features, a substantially radial sweep of the tip of an ingot rod that sweeps over the edge can produce a substantially flat evaporation pattern on the ingot rod, producing a good utilization of the expensive ingot rod material.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.