Free-standing rotational rod-fed source
US5905753A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jun 23, 1997 |
| Grant date | May 18, 1999 |
| Priority date | — |
| Expiry date | Jun 23, 2017 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C14/246
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
In a rotational rod-fed electron-beam evaporation source used with sublimating rod material, the ingot rod can be free-standing with respect to the crucible. This means that the side of the ingot rod near the tip of the rod does not contact a cooling crucible. In this way, the system can be operated in a defocused position of the electron beam, and the sweep of the electron beam can go over the edge of the ingot rod tip. Using these features, a substantially radial sweep of the tip of an ingot rod that sweeps over the edge can produce a substantially flat evaporation pattern on the ingot rod, producing a good utilization of the expensive ingot rod material.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.