Patent · US Expired

Method and apparatus for preparing specimen

US5907157A · kind A · utility

56Cited by
9References
18Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJan 30, 1997
Grant dateMay 25, 1999
Priority date
Expiry dateJan 30, 2017

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01J2237/31745
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

A method and apparatus for preparing a specimen adapted for electron microscopy comprises an evacuated specimen-processing chamber. A specimen having a surface to be processed is placed inside the processing chamber A beam-blocking member is placed close to the processed surface so as to block a part of an etching beam A first etching step is performed by directing the beam at the specimen via the blocking member. Then, the specimen and the blocking member are moved relative to each other. Finally, a second etching step is performed by directing the beam at the specimen via the blocking member. As a result, the specimen becomes a thin film and it can be observed with the electron microscope.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.