Multilayer dielectric diffraction gratings
US5907436A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Sep 29, 1995 |
| Grant date | May 25, 1999 |
| Priority date | — |
| Expiry date | Sep 29, 2015 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03H1/0244
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The design and fabrication of dielectric grating structures with high diffraction efficiency used in reflection or transmission is described. By forming a multilayer structure of alternating index dielectric materials and placing a grating structure on top of the multilayer, a diffraction grating of adjustable efficiency, and variable optical bandwidth can be obtained. Diffraction efficiency into the first order in reflection varying between 1 and 98 percent has been achieved by controlling the design of the multilayer and the depth, shape, and material comprising the grooves of the grating structure. Methods for fabricating these gratings without the use of ion etching techniques are described.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.