Patent · US Expired

Method of making a solar cell having improved anti-reflection passivation layer

US5907766A · kind A · utility

26Cited by
16References
9Claims
0Family size

Assignee

Inventors

Key dates

Filing dateOct 21, 1996
Grant dateMay 25, 1999
Priority date
Expiry dateOct 21, 2016

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY02E10/50

Abstract

A silicon solar cell has increased efficiency by providing an anti-reflection and passivation layer comprising a layer of silicon dioxide thermally grown on a surface of a silicon body and a layer of titanium dioxide deposited on the layer of silicon oxide. In fabricating the composite anti-reflection passivation layer, a layer of aluminum is first deposited on a surface of the thermally grown silicon oxide. After annealing the aluminum layer, the aluminum is removed from the silicon dioxide layer, and the layer of titanium dioxide is then deposited on the surface of the silicon dioxide from which the aluminum was removed. A layer of magnesium fluoride can be deposited on the surface of the titanium dioxide.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.