Location of pattern in signal
US5907825A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Feb 6, 1997 |
| Grant date | May 25, 1999 |
| Priority date | — |
| Expiry date | Feb 6, 2017 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG10L15/063
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A method for determining the location of a pattern, when input in isolation, within a representative input signal is provided. The method aligns the input signal with a signal representative of a plurality of connected patterns, one of which is the same as the pattern within the input signal. The method then determines the location from the results of the aligning step. The location determined using this apparatus can be used to determine an isolated reference model by extracting features of the input signal from the location found. This isolated reference model can then be used to generate a continuous reference model for the pattern, by aligning the isolated reference model with the signals representative of a plurality of connected patterns, one of which is the pattern to be modelled.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.