Patent · US Expired

Method for manufacturing a diffraction type optical element

US5910256A · kind A · utility

15Cited by
7References
6Claims
0Family size

Assignee

Inventors

Key dates

Filing dateAug 13, 1997
Grant dateJun 8, 1999
Priority date
Expiry dateAug 13, 2017

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG02B5/1857
  • WIPO fieldMaterials, metallurgy
  • WIPO sectorChemistry

Abstract

In a method for manufacturing a diffraction type optical element having an arbitrary cross-section, a laser beam of a single mode is divided into two and then is again focused on a thin film on a substrate, thereby obtaining a laser beam pattern changing periodically in intensity through interference thereof which is then irradiated onto the substrate while the substrate is positioned inclined with respect to a plane which is perpendicular to an average light beam axis of the two laser beams.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.