High-purity silica glass fabricating method using sol-gel process
US5912397A · kind A · utility
7Cited by
7References
8Claims
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Key dates
| Filing date | Mar 10, 1998 |
| Grant date | Jun 15, 1999 |
| Priority date | — |
| Expiry date | Mar 10, 2018 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC03C2203/34
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
There is provided a high-purity silica glass fabricating method using a sol-gel process. In the method, a first sol is formed by mixing 100 parts by weight of fumed silica powder with between 100 to 300 parts by weight of deionized water. The first sol is gelled, dried, powdered, and thermally treated. A second sol is formed by mixing the thermally-treated first sol with between 100 to 200 parts by weight of deionized water and 20 to 50 parts by weight of non-thermally treated original fumed silica powder. The second sol is gelled, dried, and sintered. Thus, a high-purity silica glass is formed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.