Radiation-sensitive mixture and the production of relief structures having improved contrast

US5914219A · kind A · utility

Assignee

• BASF SE

Inventors

• Dirk Funhoff · Heidelberg, DE
• Reinhold Schwalm · Monsheim, DE
• Horst Binder · Lampertheim, DE

Key dates

• Filing date: Oct 22, 1996
• Grant date: Jun 22, 1999
• Expiry date: Oct 22, 2016

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10S430/122
• WIPO field: Basic materials chemistry
• WIPO sector: Chemistry

Abstract

Positive-working radiation-sensitive mixtures, essentially consisting of PA1 (a1) a water-insoluble organic binder which contains acid-labile groups and is rendered soluble in aqueous alkaline solutions by the action of an acid, or PA1 (a2.1) a polymeric binder which is insoluble in water but soluble in aqueous alkaline solutions and PA1 (a2.2) an organic compound whose solubility in an aqueous alkaline developer is increased by the action of an acid, and PA1 (b) an organic compound which produces an acid under the action of actinic radiation, which additionally contain PA1 (c) a strongly basic organic compound having hydroxide, alkoxide or phenoxide anions, are suitable for the production of relief structures having improved contrast.