Positive resist composition
US5916728A · kind A · utility
24Cited by
3References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 15, 1997 |
| Grant date | Jun 29, 1999 |
| Priority date | — |
| Expiry date | Oct 15, 2017 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/106
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A positive photo resist composition of chemical amplifying type, which is excellent in various properties such as sensitivity resolution, heat resistance, film retention ratio, applicability and profile and also excellent in time delay effect resistance, and which comprises PA1 (A) a resin which is converted to alkali-soluble from alkali-insoluble or alkali-slightly soluble by the action of an acid, PA1 (B) an acid generator and PA1 (C) a tertiary amine compound having an aliphatic hydroxyl group.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.