Cleaning and/or stripping composition, based on a dibasic acid ester and an ether
US5916860A · kind A · utility
5Cited by
7References
11Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 22, 1997 |
| Grant date | Jun 29, 1999 |
| Priority date | — |
| Expiry date | Sep 22, 2017 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC11D7/266
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
A stripping and/or cleaning composition is disclosed, which contains, by volume: (a) 1 to 90% of at least one C.sub.1 -C.sub.4 dialkyl ester of at least one C.sub.4 -C.sub.6 aliphatic diacid; and (b) 99 to 1% of at least one ether selected from the group consisting of ethers with a flash point above 5.degree. C., at least one methoxy group per molecule and a molecular weight of less than 200.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.