Acid labile photoactive composition
US5917024A · kind A · utility
0Cited by
7References
9Claims
0Family size
Assignee
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Key dates
| Filing date | Feb 20, 1998 |
| Grant date | Jun 29, 1999 |
| Priority date | — |
| Expiry date | Feb 20, 2018 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/022
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photoresist composition comprising an alkali soluble resin and the reaction product of an ortho-naphthoquinone diazide sulfonic acid ester and a vinyl ether. In use, the photoresist is characterized by having at least a portion of the hydroxyl groups on the alkali soluble resin reacted with the photoactive compound and then deblocked by acid generation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.