Scan exposure method and apparatus
US5917580A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Aug 28, 1997 |
| Grant date | Jun 29, 1999 |
| Priority date | — |
| Expiry date | Aug 28, 2017 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70358
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A scan type exposure method and apparatus in which a projection optical system projects, at a projection station, a portion of a pattern of an original onto a region on a substrate, an original stage moves the original relative to the projection optical system in an original scanning direction, a first substrate stage moves the substrate relative to the projection optical system in a substrate scanning direction, a second substrate stage moves the substrate relative to the projection optical system in an optical axis direction of the projection optical system, a synchronism controller controls, in the projection of the original onto the substrate through the projection optical system, synchronism between the movement of the original stage in the original scanning direction and the movement of the first substrate stage in the substrate scanning direction, a measuring device measures a position of the surface of the substrate with respect to the optical axis direction at a measurement point spaced from the projection station of and a stage controller controls, in the control of the synchronism between the movement of the original stage and the movement of the first substrate stage th…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.