Silicon micromachine with sacrificial pedestal
US5920013A · kind A · utility
14Cited by
8References
8Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 7, 1997 |
| Grant date | Jul 6, 1999 |
| Priority date | — |
| Expiry date | Feb 7, 2017 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB81C2203/031
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
A protective coating is utilized to protect the silicon during a wet chemical etch step in the process of making a micromachine, thereby preventing the formation of etched holes or pits in the micromachine. In another embodiment, silicon sacrificial pedestals are used to eliminate or greatly reduces the electrical potential difference between metal on the glass substrate and the silicon, thereby eliminating arcing and the resulting damage to silicon and metal. These pedestals may be removed after the anodic bond.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.