Method and apparatus for the preparation of clean gases
US5922105A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Mar 19, 1998 |
| Grant date | Jul 13, 1999 |
| Priority date | — |
| Expiry date | Mar 19, 2018 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB01D2259/40083
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A method and apparatus for preventing contamination of a substrate or a substrate surface, and particularly relates to prevention of contamination of raw materials, semi-finished products, base materials of products and substrate surface in a high-tech industry such as in the production of semiconductors and liquid crystals. A gas coming into contact with a base material or substrate is purified by dust removing apparatus and adsorption and/or absorption apparatus so that the concentration of fine particles in the gas is below class 1,000 and a non-methane hydrocarbon concentration is below 0.2 ppm. Thereafter, the base material or the substrate surface is exposed to this gas.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.