Semiconductor liquid phase epitaxial growth method and apparatus, and its wafer holder
US5922126A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | May 30, 1997 |
| Grant date | Jul 13, 1999 |
| Priority date | — |
| Expiry date | May 30, 2017 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC30B19/06
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The disclosed semiconductor liquid phase epitaxial growth method and apparatus and the wafer holder used therefor can improve the deposition of polycrystal, the non-uniformity of film thickness, the thermal deterioration of the substrate, etc. The wafer holder comprises a holder body (11) formed with at least one wafer accommodating space in which at least two semiconductor wafers (15) can be held in such a way that reverse surfaces of the two wafers are brought into contact with two opposing inner side walls of the wafer holder and right surfaces of the two wafers are opposed to each other with a predetermined space between the two; and a holder cover (12) for covering an open surface of the holder body (11). Further, the holder body (11) is formed with an inlet port (16) for injecting a source into the wafer accommodating space and an outlet port (13) for exhausting the source from the wafer accommodating space.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.