Apparatus for etching and coating sample specimens for microscopic analysis
US5922179A · kind A · utility
45Cited by
17References
14Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 20, 1997 |
| Grant date | Jul 13, 1999 |
| Priority date | — |
| Expiry date | Oct 20, 2017 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/34
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An apparatus and process for the etching and coating of samples in a single vacuum chamber, thus minimizing handling and transfer of the samples is provided. The apparatus includes a sealed chamber and a vacuum pump for forming and maintaining a vacuum in the chamber, a first ion gun positioned in the chamber to etch a sample, a sputtering target in the chamber, and at least one additional ion gun positioned in the chamber to cause material from the target to be directed onto the sample.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.