Aqueous developing solutions for reduced developer residue
US5922522A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Apr 29, 1998 |
| Grant date | Jul 13, 1999 |
| Priority date | — |
| Expiry date | Apr 29, 2018 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/322
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An alkaline aqueous developing solution for developing photoresists or the like contains, as an anti-scum agent, an ethoxylated surfactant having the general formula: EQU R--O--(AO).sub.n !.sub.m --X (I) where AO are alkylene oxide units selected from ethylene oxide units (CH.sub.2 --CH.sub.2 --O) and propylene oxide units (CH(CH.sub.3)--CH.sub.2 --O) or (CH.sub.2 --CH(CH.sub.3)--O), where R is a hydrophobic group, X is H or an anionic group, m is from 1 to 3, and n is at least about 8, and the molar ratio of total ethylene oxide units to total propylene oxide units is between about 1:4 and about 4:1, preferably between about 2:3 and about 3:2.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.