Method and apparatus for constant composition delivery of hydride gases for semiconductor processing
US5925232A · kind A · utility
5Cited by
10References
42Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Dec 6, 1996 |
| Grant date | Jul 20, 1999 |
| Priority date | — |
| Expiry date | Dec 6, 2016 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S438/935
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Described are methods and apparatuses for the electrochemical generation and constant concentration delivery of high purity gases used in the production of semiconductors and the doping of semiconductors.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.