Photosensitive polymer composition and element containing photosensitive polyamide and mixture of acrylates
US5925498A · kind A · utility
6Cited by
19References
23Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 16, 1997 |
| Grant date | Jul 20, 1999 |
| Priority date | — |
| Expiry date | Jun 16, 2017 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/037
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photosensitive composition can be used to prepare negative-working photosensitive elements such as lithographic printing plates. The composition includes a first photocrosslinkable aromatic resin having photocrosslinkable groups and a number average molecular weight of at least about 1500. Also included is a mixture of a polyalkyleneglycol diacrylate and polyacrylate polymerizable monomers, a photocrosslinkable polyester, a photoinitiator, and a photosensitizer. The photosensitive resins are present at a total weight ratio to the polymerizable monomers of at least 1.5:1.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.