Efficient offset mask generator for pseudo-noise sequence generator
US5926070A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Mar 4, 1998 |
| Grant date | Jul 20, 1999 |
| Priority date | — |
| Expiry date | Mar 4, 2018 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH03K3/84
- WIPO fieldBasic communication processes
- WIPO sectorElectrical engineering
Abstract
Apparatus for providing a reference pseudo-noise ("PN") sequence, and for providing a secondary PN sequence shifted with respect to the reference PN sequence by a number of chips that can be sequentially shifted. The apparatus includes a first pseudo-noise sequence generator ("PNSG"), the PNSG generating the reference PN code, having N stages, each stage being at one of two states, and having a feedback loop from the output of the PNSG, the value on the feedback loop being stored in each stage 1, 2, 3, . . . N, after being multiplied by a constant associated with the stage, C1, C2, C3, . . . CN, respectively, and the result added to the value in the previous stage, with "0" being deemed to be the value in the stage previous to the first stage, and then stored in the stage. Also provided is a mask generator/shifter comprising a second PNSG having N stages, wherein the N stages of the second PNSG may be loaded with a shift-and-add mask, M=m.sub.1, m.sub.2, . . . m.sub.N-1, m.sub.N. A plurality of N logical AND steps are provided, each logical AND step being connected to multiply the states of the corresponding stage of the first PNSG and of the second PNSG. Finally, a plurality of lo…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.