Patent · US Expired

Optical apparatus for rapid defect analysis

US5926266A · kind A · utility

16Cited by

11References

24Claims

0Family size

Assignee

International Business Machines Corporation · US

Inventors

Alan Dorundo · Boca Raton, US
Michael G. Lisanke · Boynton Beach, US
Huizong Lu · Coral Springs, US
Richard McCormick · Vernon Hills, US
Lanphuong Thi Pena · Jacksonville, US
Eric V. Schnetzer · Boynton Beach, US
Ali Reza Taheri · Boca Raton, US

Key dates

Filing date	Sep 23, 1996
Grant date	Jul 20, 1999
Priority date	—
Expiry date	Sep 23, 2016

Classification

Technology area (CPC G)Physics
CPC primaryG01B2290/70
WIPO fieldMeasurement
WIPO sectorInstruments

Abstract

Apparatus for inspecting the surface of a sample includes a wide scanning interferometer, which is used to locate defects, or anomalies in the surface, and a narrow scanning interferometer, which is used to develop profiles of individual defects found by the narrow scanning interferometer. The sample may be driven in rotation about an axis, while the interferometers are independently moved radially to the axis.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.