Cleaning apparatus
US5927305A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Feb 19, 1997 |
| Grant date | Jul 27, 1999 |
| Priority date | — |
| Expiry date | Feb 19, 2017 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S134/902
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A cleaning apparatus is disclosed which is capable of simultaneously and precisely cleaning two sides of a substrate required to be cleaned, such as a silicon wafer. The cleaning apparatus has a holding unit for horizontally holding a substrate required to be cleaned, a rotating unit for rotating the holding unit, a first cleaning-fluid injection unit disposed above the holding unit and arranged to inject cleaning fluid with high-frequency acoustic waves to the surface of the substrate supported by the holding unit and a second cleaning-fluid injection unit disposed below the holding unit and arranged to inject cleaning fluid to the reverse side of the substrate supported by the holding unit.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.