Aqueous stripping and cleaning compositions containing hydroxylamine and use thereof
US5928430A · kind A · utility
19Cited by
11References
2Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 12, 1997 |
| Grant date | Jul 27, 1999 |
| Priority date | — |
| Expiry date | May 12, 2017 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC11D2111/14
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
An aqueous stripping composition comprising a mixture of about 55% to 70% by weight of a polar amine solvent, about 22.5 to 15% by weight of a basic amine, especially hydroxylamine, a corrosion inhibitor and water. The stripping composition is effective for stripping photoresists, residues from plasma process generated organic, metal-organic materials, inorganic salts, oxides, hydroxides or complexes in combination with or exclusive of organic photoresist films at low temperatures.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.