RF plasma source for cleaning spacecraft surfaces
US5928461A · kind A · utility
Inventors
Key dates
| Filing date | May 15, 1997 |
| Grant date | Jul 27, 1999 |
| Priority date | — |
| Expiry date | May 15, 2017 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/46
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A plasma source uses radio frequency electromagnetic radiation to ionize and dissociate gas molecules into reactive species within a plasma generation tube and emits the species to react with and remove contaminants from surfaces on a spacecraft. The source of the radiation is an antenna brazed to the outside of the plasma generation tube. Permanent magnets ring the plasma generation tube within a metallic housing to generate a magnetic field. Pole pieces are provided to improve the strength of the field and to improve its uniformity and axial orientation within the plasma generation tube. A plenum and a gas diffusing element distribute gas entering the plasma generation tube.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.