X-ray absorber in X-ray mask and method for manufacturing the same
US5928816A · kind A · utility
3Cited by
1References
24Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 21, 1997 |
| Grant date | Jul 27, 1999 |
| Priority date | — |
| Expiry date | Nov 21, 2017 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG21K1/10
- WIPO fieldEngines, pumps, turbines
- WIPO sectorMechanical engineering
Abstract
X-ray absorber in an X-ray mask and a method for manufacturing the same which includes a first layer of crystalline phase formed on a predetermined portion of the surface of a membrane and a second layer of amorphous phase formed on the first layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.