Low residue aqueous hard surface cleaning and disinfecting compositions
US5929016A · kind A · utility
39Cited by
8References
17Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Oct 15, 1997 |
| Grant date | Jul 27, 1999 |
| Priority date | — |
| Expiry date | Oct 15, 2017 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC11D1/72
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
Aqueous based cleaning compositions simultaneously featuring disinfecting, low residue deposit and good cleaning characteristics are provided. The compositions include one or more quaternary amine compounds as disinfecting active agents, an organic solvent system which includes glycol mono-n-butyl ether or a binary system including a glycol ether with a linear primary alcohol, and either one or more betaines, or one or more amine oxides as a surfactant constituent.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.