Photoprocessing method
US5932118A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Apr 25, 1997 |
| Grant date | Aug 3, 1999 |
| Priority date | — |
| Expiry date | Apr 25, 2017 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S438/94
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
In processing an object to be processed by a laser beam, the laser beam is expanded by a beam expander and is introduced into a mask in which a light transmitted portion having a desired pattern is formed, the laser beam introduced into the mask is passed through the light transmitted portion having a desired pattern, to obtain a laser beam corresponding to the pattern of the light transmitted portion as well as having an approximately uniform energy distribution, the laser beam is formed and projected on the object to be processed by an image forming lens, and processing corresponding to the pattern of the light transmitted portion is performed on the object to be processed by the laser beam formed and projected. By this photoprocessing, a part of photoelectric converting elements in a photovoltaic device are removed to perform groove processing, or an amorphous semiconductor film is crystallized.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.