Process and device for the lighting-supported structuring of porous silicon

US5935410A · kind A · utility

Assignee

• Forschungszentrum Jülich GmbH · DE

Inventors

• Markus Thonissen · Nettetal, DE
• Michael Kruger · Aachen, DE
• Hans Luth · Aachen, DE
• Michael Berger · Bad Vilbel, DE
• Wolfgang Theiss · Aachen, DE
• Gilles Lerondel · Saint-Julien-les-Villas, FR
• Robert Romestain · Bruz, FR

Key dates

• Filing date: Sep 19, 1997
• Grant date: Aug 10, 1999
• Expiry date: Sep 19, 2017

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01L21/3063
• WIPO field: Semiconductors
• WIPO sector: Electrical engineering

Abstract

A process for producing a structured area of porous silicon on a substrate, in which silicon is etched and structured by means of illumination, includes selectively aiming the illumination during or after the formation of the porous silicon directly at a selected area of a p-doped substrate in order to effect etching and structuring of the porous silicon in another area. A device for carrying out the process includes an illuminating system for supporting the etching process and for structuring the porous silicon, in which the illuminating system is selectively aimed during or after the formation of the porous silicon directly at a selected area of p-doped substrate in order to effect etching and structuring of the porous silicon in another area.