Cleaning process for harmful gas
US5935540A · kind A · utility
13Cited by
3References
10Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 17, 1998 |
| Grant date | Aug 10, 1999 |
| Priority date | — |
| Expiry date | Apr 17, 2018 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB01D53/8659
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
There is disclosed a process for cleaning a harmful gas which comprises bringing a harmful gas containing at least one member selected from the group consisting of nitrogen fluorides, tungsten fluorides, silicon fluorides, hydrogen fluoride and fluorine, especially nitrogen trifluoride into contact with a cleaning agent comprising stannous oxide as an effective ingredient at a temperature of 200.degree. C. at the lowest. The above process makes it possible to clean the harmful gas in a high performance at a relatively low temperature without by-producing a harmful gas or a gas with a fear of causing environmental pollution.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.