Silicon dioxide containing coating
US5935638A · kind A · utility
22Cited by
16References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 6, 1998 |
| Grant date | Aug 10, 1999 |
| Priority date | — |
| Expiry date | Aug 6, 2018 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/02282
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A silicon dioxide containing coating can be used for multi-layer hermetic coatings, interlayer dielectric coatings, and flat panel display coatings. The coating is formed by applying a coating composition comprising polysilastyrene to a substrate and heating the polysilastyrene in an oxidizing atmosphere.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.