Method of manufacturing an injector for chemical vapor deposition processing
US5935647A · kind A · utility
10Cited by
24References
2Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 4, 1997 |
| Grant date | Aug 10, 1999 |
| Priority date | — |
| Expiry date | Jun 4, 2017 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/45595
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method of manufacturing an injector for chemical vapor deposition (CVD) processing is provided. The method comprises the steps of selecting an elongated member of solid material having first and second ends and a gas delivery surface. At least one elongated passage for receiving a gas is formed in the elongated member and extending between the ends. At least one elongated distribution channel is formed by wire electrode discharge machining (EDM) extending from the elongated passage to the gas delivery surface for providing gas to the gas delivery surface.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.