Unwinding of plastic film in the presence of a plasma
US5935662A · kind A · utility
2Cited by
14References
6Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 12, 1997 |
| Grant date | Aug 10, 1999 |
| Priority date | — |
| Expiry date | Sep 12, 2017 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/545
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Supplying gases towards the web as it separates from the drum in a plasma-enhanced chemical vapor deposition system reduces the sticking of the web to the drum, and thus prevents power supply dropouts. The gas supplied can form into a plasma that helps dissipate the static charge which builds onto the web as it rolls off of the drum. By reducing the arcing and power supply dropouts, the quality of the deposited layer formed in a deposition zone can be improved.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.