Controlled site epitaxy on silver halide grains
US5935774A · kind A · utility
4Cited by
5References
10Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 19, 1998 |
| Grant date | Aug 10, 1999 |
| Priority date | — |
| Expiry date | Jun 19, 2018 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03C2200/03
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A radiation-sensitive silver halide emulsion is disclosed comprised of composite grains including host grains having predominantly {111} crystal faces, cuprous ions adsorbed to the {111} crystal faces of the host grains to act as a site director for subsequently deposited silver salt, and silver salt protrusions having their highest incidence adjacent at least one of the corners and edges of the host grains.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.