Patent · US Expired

Films based on polyamide and on polymers containing polyamide blocks and polyether blocks

US5936044A · kind A · utility

9Cited by
2References
7Claims
0Family size

Assignee

Inventors

Key dates

Filing dateOct 15, 1996
Grant dateAug 10, 1999
Priority date
Expiry dateOct 15, 2016

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC08J2377/00
  • WIPO fieldMacromolecular chemistry, polymers
  • WIPO sectorChemistry

Abstract

The invention relates to films based on PA-6 or PA-6,6 and on a copolymer containing polyamide (6 or 6,6) blocks and ploytetramethylene glycol blocks. They have greater impact strengths than PA-6 or PA-6, 6 film.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.