Patent · US Expired

Silica glass monolith fabricating method using sol-gel process

US5938805A · kind A · utility

4Cited by
10References
18Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMar 10, 1998
Grant dateAug 17, 1999
Priority date
Expiry dateMar 10, 2018

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC03C1/006
  • WIPO fieldOther special machines
  • WIPO sectorMechanical engineering

Abstract

A silica glass monolith fabricating method using a sol-gel process. In the method, a first sol is formed by mixing 100 parts by weight of high-density silica containing powder with 100-300 parts by weight of water, and rapidly dried, while the pH of the first sol is being controlled in the range between 9 and 11. The dried first sol is powdered and then thermally treated at or above 600.degree. C., and a second sol is formed by mixing the thermally-treated powdered first sol with 100-200 parts by weight of deionized water and a aqueous organic binder. The second sol is gelled in a mold, dried, thermally treated, and sintered. Thus, a high-purity silica glass monolith is obtained.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.